Sputtering and plasma etching to cite this article. Discharges, sputtering, ionsurface interaction, thinfilm processing. Surface features of conductors eroded by sputtering in a magnetron glow discharge plasma. Glow discharge optical emission spectrometry gdoes is based upon the measurement of photons emitted by excited state species in the plasma, while glow discharge. Sputtering in a glow discharge for spectrochemical analysis. A glow discharge plasma can be defined as a partially ionized low pressure gas in a quasineutral state sustained by the presence of energetic electrons. Principle of the glow discharge and its use for mass spectrometry. Functionalising surfaces using polymeric thin films is an industrially important field. Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge.
Pdf thin film deposition from reactive plasmas running. Gas discharge plasmas and their applications citeseerx. Sputtering and plasma etching kindle edition by brian chapman. Sputtering and plasma etching 9780471078289 by chapman, brian and a great selection of similar new, used. Deposition of thin films by sputtering, ion plating, plasmaenhanced chemical vapor deposition, and plasma polymerization. Plasma etching techniques including rie, pe, icp, and drie. Use features like bookmarks, note taking and highlighting while reading glow discharge processes. Nevertheless, many of the plasma concepts are of great utility in helping us to derive some understanding and control of glow discharge processes, even on a semiquantitative basis. It is created by applying a voltage between two metal electrodes in a. Reactive ion etching is a simple operation, and an economical solution for general plasma etching. Glow discharge phenomena in plasma etching and plasma. Some manufacturers introduce a quartz, graphite or silicon carbide plates to avoid sputtering and redeposition of the lower electrode material.
Pdf glow discharges are used in a large number of application fields. Sources of ions for ion implantation, and focused ion beam patterning. Applications and limitations of optical spectroscopy for process control, as well as for more fundamental investigations, of glow discharge sputter deposition and emission spectroscopies allows the determination of concentrations and spatial distributions of sputtered and background gas species in ground, metastable, ionized, and excited states. The effects of plasma ions, electrons and other energetic particles are now widely used for substrate cleaning as well as. Glow discharge plasma is a tool for heating, sputtering, etching, nitriding and ionization as well as an activator for gaseous atoms and molecules. Abdelrahman accelerators and ion sources department, nuclear research center, atomic energy authority, 759 inchas, atomic energy, cairo, egypt abstract.
It involves a highspeed stream of glow discharge of an appropriate gas mixture being shot in pulses at a sample. Subjects range from voltage, distributions encountered in plasma develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by. Removal of surface layers and films by sputter etching, reactive ion etching, and resist stripping. Physics of glow discharge plasmas and plasmasurface. The plasma source, known as etch species, can be either charged or neutral atoms and radicals.
Quantitative depth profile analysis by glow discharge. Initially, adsorption of these species occurs depending. Plasma etching is a form of plasma processing used to fabricate integrated circuits. Subjects range from voltage, distributions encountered in plasma etching systems to plasmaelectron interactions that contribute to sustaining the discharge. Plasma physics page 15 dc glow discharge free electrons from secondary emission and from ionization are accelerated in the field to continue the above processes, and a steady state selfsustaining discharge is obtained.
During the process, the plasma generates volatile etch products at room temperature from the chemical. Plasma glow discharge inside pvd coating machine chamber hcvac pvd lillian. It is well known that a large number of ions, electrons and excited radicals coexist in plasma. One technique for achieving nanoscale, controlled surface functionalization is plasma deposition.
Also plasma assisted etching techniques and plasma polymerization are extensively used in many industrial processes. It is formed when a cell, consisting of an anode and a cathode, is filled with a gas at low pressure e. Plasma glow discharge inside pvd coating machine chamber. Subjects range from voltage, distributions encountered in plasma etching systems to plasma. About the author brian chapman is the author of glow discharge processes. Adjustment your routine to hang or throw away the moment to just talk with your good friends. Amongst sputtering and plasma etching folks, the words plasma and glow discharge tend to be used synonymously to the horror of plasma physicists, im sure. These plates are typically called a coverplate or tray. Selecting this option will search all publications across the scitation platform selecting this option will search all publications for the publishersociety in context. Optical spectroscopy for diagnostics and process control.
Glow discharges, plasma etching, sputtering physics. The electron energy required in order to break chemical bonds in the molecules is usually less than the energy required to ionize these molecules. Plasma deposition has advantages over other surface engineering processes, including that it is solvent free, substrate and geometry independent, and the surface properties of the film can be designed by. Sputtering and plasma etching kindle edition by chapman, brian. Download it once and read it on your kindle device, pc, phones or tablets. Download it once and read it on your kindle device, pc, phones. Plasma etching is the method of using a high energy plasma to selectively remove material from a surface. This option allows users to search by publication, volume and page selecting this option will search the current publication in context. Glow discharge plasma properties of gases of environmental. Etching different etching processes are selected depending upon the particular material to be removed. Glowdischarge sputtering means the energetic particles used to strike target is generated by glowdischarge. Glow discharge analytical spectrometric techniques are based on the detection and quantification of sample species within the plasma.